Sat, 16 May 2026 RO   EN        Project List »  www.nipne.ro/proiecte/pn4/25-projects.html Acronym: DIOEMT Contracting Authority: IFA Number / Date of the contract: ELI-RO/OMP/2024_001 / 2025-11-01 Program: 5.9/5.9.1/ELI-RO Project Manager: Dr. Octavian Danila Partners: Starting date / finishing date: 2025-11-01 / 2027-12-31 Project value: 2.377.766 RON Abstract: This project aims to develop innovative technologies to overcome the conventional manufacturing techniques for high-performance optical components in ultra-high-intensity lasers. In traditional optical component manufacturing, polishing has been performed using abrasive particles; however, this contact polishing method has resulted in invisible defects in the subsurface and residual abrasive particles, leading to reduced laser damage resistance. Additionally, vacuum deposition methods have been used for coating deposition on substrate surfaces, which introduced constraints inherent to deposition methods, such as limitations in film thickness control, material constraints, and contamination associated with the deposition process. To overcome these challenges, this project aims to manufacture high-performance optical components using a fundamentally different approach from conventional polishing and film deposition methods. Specifically, the following challenges will be addressed. Objectives: 1.Substrate Polishing using Ion Beam Figuring Ion beam figuring (IBF), which is used in the manufacture of large precision mirrors for extreme ultraviolet (EUV) exposure in semiconductor lithography, will be introduced for the manufacture of large laser optical elements. IBF is a non-contact processing method and therefore has significant advantages over conventional polishing methods. However, there is an issue of defect generation due to ion collisions, which we plan to address by adjusting the ion energy to remove defects in the etching mode. 2. High-Precision Cleaning of Substrate Surfaces before Deposition Removing submicron-sized particles from substrate surfaces is a challenging task, but such contamination significantly affects the laser-induced damage threshold (LIDT). We will establish substrate cleaning methods before film deposition, such as impact removal using dry ice. 3. Large-Area Uniform Coating using Atomic Layer Deposition (ALD) Forming high-precision, uniform coatings over large areas has been challenging with conventional vapor deposition methods; however, it is theoretically achievable with atomic layer deposition. We will develop a method suitable for future large-scale applications in the following topics. (1) Development of Ultra-High-Damage Coatings using Mixed Material Deposition We will achieve high LIDT films through mixed film deposition, a method already reported in pioneering studies, by further improving it using ALD. We also aim for variable index coatings and graded index coatings for high-power laser applications. The expansion of the bandwidth of the dielectric gratings is the subject of development. (2) Development of High-Durability Optical Devices Capable of Withstanding High Repetition Rates Using High-Thermal-Conductivity Materials By combining high-thermal-conductivity materials with conventional oxides, we will create optical devices with excellent thermal conductivity and develop optical devices that maintain high durability even under high-repetition conditions. These developments in elemental technologies will bring about innovative improvements in the manufacturing of high-durability laser optical devices and are compatible with numerous devices planned for adoption at the optical center currently under preparation. Upon completion of the optical center, the results of these technological developments will be immediately applicable for practical use. THE STAGES OF THE PROJECT AND DELIVERY DATES 1. Numerical analyses of laser induced thermal properties for multilayered and nanostructured optical structures, with a focus on either obtaining control over the electromagnetic field, or exhibiting a superior laser induced damage threshold (2026-12-31) 2. Testing of the deposited oxidic materials by Atomic Layer Deposition (ALD) (2026-12-31) 3. Acquisition of the experimental system required for depositing and investigating multilayer optical systems (2027-03-01) 4. Deposition of mixed multilayer optical systems and confirmation of superior optical properties in terms of field control and/or laser induced damage threshold (2027-12-31) 5. Training of the team, consisting of technicians, doctoral students and post-doctoral assistant researchers in the realization of numerical analyses and experimental validation of the optical properties of the deposited materials (2027-12-31) RESULTS PUBLISHED ARTICLES RESEARCH TEAM Back to the Project List Versiunea proiectului in limba romana      Address: Str. Reactorului no.30, P.O.BOX MG-6, Bucharest - Magurele, ROMANIA Tel: +(4021) 404.23.00, Fax: +(4021) 457.44.40 2026 IFIN-HH. All rights reserved.